Semiconductor device and manufacturing method thereof

ABSTRACT

A semiconductor device and a manufacturing method thereof are provided. The manufacturing method includes following steps. A mold is provided. The mold has a chamber and a plurality of protrusions in the chamber. A thermosetting material is injected into the chamber. The thermosetting material is cured. A parting step is performed to separate the cured thermosetting material from the mold, so as to form an interposer substrate. A plurality of blind holes corresponding to the protrusions is formed on the interposer substrate. A conductive material is filled into the blind holes to form a plurality of conductive pillars. A conductive pattern layer is formed on a surface of the interposer substrate. The conductive pattern layer is electrically connected with the conductive pillars.

CROSS-REFERENCE TO RELATED APPLICATION

This application claims the priority benefit of Taiwan applicationserial no. 102118253, filed on May 23, 2013. The entirety of theabove-mentioned patent application is hereby incorporated by referenceherein and made a part of this specification.

TECHNICAL FIELD

The technical field relates to a semiconductor device and amanufacturing method thereof, and more particularly, to a semiconductordevice manufactured by using a mould and a manufacturing method thereof.

BACKGROUND

In recent years, in the semiconductor industry, a 3D stacking technologyis developed to shorten the wiring between chips, reduce the sizes ofdevices, and help to construct a complete 3D chip structure.Through-substrate vias (TSV) are key components for connectingvertically stacked chips in the 3D stacking technology.

An interposer can be disposed to replace the wire packaging techniquefor electrically connecting heterogeneous chips. Even thoughthrough-silicon vias (TSV) and a redistribution layer (RDL) of optimaldimension ratios can be realized in an interposer along with thedevelopment of the 3D stacking technology, many costly semiconductorprocess steps need to be performed repeatedly to achieve the TSV and theRDL of the optimal dimension ratios. As a result, the manufacturing costcannot be effectively reduced.

SUMMARY

An embodiment of the present disclosure provides a manufacturing methodof a semiconductor device. The manufacturing method includes followingsteps. A mould is provided. The mould has a chamber and a plurality ofprotrusions in the chamber. A thermosetting material is injected intothe chamber. The thermosetting material is cured. A parting step isperformed to separate the cured thermosetting material from the mould,so as to form an interposer substrate. A plurality of blind holescorresponding to the protrusions is formed on the interposer substrate.A conductive material is filled into the blind holes to form a pluralityof conductive pillars. A conductive pattern layer is formed on a firstsurface of the interposer substrate. The first conductive pattern layeris electrically connected with the conductive pillars.

An embodiment of the present disclosure provides a manufacturing methodof a semiconductor device. The manufacturing method includes followingsteps. A mould and a metal film are provided. The mould has a cover anda chamber, and the cover has a plurality of vias. The metal film isheated and pressed to the cover to pass the metal film through the viasof the cover and form a plurality of conductive pillars in the chamber.A thermosetting material is injected into the chamber of the mould toallow the thermosetting material to encapsulate the conductive pillars.The thermosetting material is cured. A parting step is performed toseparate the cured thermosetting material from the mould, so as to forman interposer substrate. The conductive pillars are in the interposersubstrate. A first conductive pattern layer is formed on a first surfaceof the interposer substrate. The first conductive pattern layer iselectrically connected with the conductive pillars.

An embodiment of the present disclosure provides a semiconductor device.The semiconductor device includes an interposer substrate, a pluralityof conductive pillars, and a first conductive pattern layer. Thematerial of the interposer substrate is an insulator. The interposersubstrate has a first surface. A plurality of blind holes and aplurality of grooves are formed on the first surface of the interposersubstrate. A plurality of conductive pillars is in the blind holes ofthe interposer substrate. The first conductive pattern layer is disposedin the grooves. A surface of the first conductive pattern layer and thefirst surface of the interposer substrate are coplanar.

Several exemplary embodiments accompanied with figures are described indetail below to further describe the disclosure in details.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings are included to provide further understanding,and are incorporated in and constitute a part of this specification. Thedrawings illustrate exemplary embodiments and, together with thedescription, serve to explain the principles of the disclosure.

FIG. 1 is a flowchart of a manufacturing method of a semiconductordevice according to an embodiment of the present disclosure.

FIGS. 2A-2L are diagrams illustrating the manufacturing method of asemiconductor device in FIG. 1.

FIG. 3 is a diagram of a mould in FIG. 2A according to anotherembodiment of the present disclosure.

FIGS. 4A-4H are diagrams illustrating the manufacturing method of asemiconductor device in FIG. 1 according to another embodiment of thepresent disclosure.

FIGS. 5A-5I are diagrams illustrating the manufacturing method of asemiconductor device in FIG. 1 according to yet another embodiment ofthe present disclosure.

FIGS. 6A-6I are diagrams illustrating the manufacturing method of asemiconductor device in FIG. 1 according to still another embodiment ofthe present disclosure.

FIG. 7 is a flowchart of a manufacturing method of a semiconductordevice according to another embodiment of the present disclosure.

FIGS. 8A-8L are diagrams illustrating the manufacturing method of asemiconductor device in FIG. 7.

FIG. 9 is a diagram of a semiconductor device according to an embodimentof the present disclosure.

DETAILED DESCRIPTION OF DISCLOSED EMBODIMENTS

FIG. 1 is a flowchart of a manufacturing method of a semiconductordevice according to an embodiment of the present disclosure. FIGS. 2A-2Lare diagrams illustrating the semiconductor device manufacturing methodin FIG. 1. FIG. 3 is a diagram of a mould in FIG. 2A according toanother embodiment of the present disclosure. Referring to FIG. 1 andFIG. 2A first, a mould 50 is provided, where the mould 50 has a chamber52 and a plurality of protrusions 54 in the chamber 52 (step S110). Tobe specific, the chamber 52 is composed of a top cover 50 a and a bottomcover 50 b, and the spacing of the chamber 52 is D1 (as shown in FIG.2B). In the present embodiment, the spacing of the chamber 52 is D1 andmay be slightly smaller than 5 mm.

In the present embodiment, the mould 50 and the protrusions 54 areintegrally formed by using the same material. For example, the mould 50and the protrusions 54 are made of tungsten alloy. In other embodiments,as shown in FIG. 3, the mould 50 and the protrusions 54 a may also beformed by using different materials. For example, the protrusions 54 aare formed by using silicon or tungsten alloy on a top cover 50 c of themould 50, while the mould 50 is formed by using a metal materialdifferent from that of the protrusions 54 a.

The length of the protrusions 54 is D2 (as shown in FIG. 2B). However,the spacing of the chamber and the length of the protrusions are notlimited in the present disclosure and can be adjusted according to theactual requirement. Besides, in the present embodiment, the length D2 ofthe protrusions 54 is smaller than the spacing D1 of the chamber 52.

Referring to FIG. 2B again, a thermosetting material M1 is injected intothe chamber 52 (step S120). In the present embodiment, the thermosettingmaterial M1 is an insulator, such as epoxy molding compound (EMC),polyimide (PI), silicone resin, polyurethane (PU), or a compound of oneof aforementioned material with a filler, a hardener, a coupling agent,or any other additive agent. Next, referring to FIG. 2C, thethermosetting material M1 is cured (step S130) and turned into a curedthermosetting material M2.

Thereafter, referring to FIG. 2D, a parting step is performed toseparate the cured thermosetting material M2 from the mould 50, so as toform an interposer substrate 110. A plurality of blind holes H1corresponding to the protrusions 54 are formed on the interposersubstrate 110 (step S140).

Referring to FIG. 2E, a conductive material C1 is filled into the blindholes H1 to form a plurality of conductive pillars 110 a (step S150). Tobe specific, the conductive material C1 may be copper (Cu), titanium(Ti), tantalum (Ta), tungsten (W), or a combination of aforementionedmetals and metal compounds but not limited herein. The conductivematerial C1 may be filled into the blind holes H1 through a platingprocess or a deposition process. The blind holes H1 can be completely orpartially filled with the conductive material C1 as long as anelectrical connection is achieved. After that, metal on the surface S1is removed through a polishing process or an etching process to form theconductive pillars 110 a.

Thereby, in the present embodiment, the interposer substrate 110 isfabricated by using the thermosetting material M1 (for example, EMC),and the shape and thickness of the interposer substrate 110 and thepositions and depth of the blind holes H1 are determined according tothe actual requirement and through the mould 50. To be specific, in thepresent embodiment, the mould 50 (as shown in FIG. 2A) with theprotrusions 54 (or the protrusions 54 a in FIG. 3) is designed, and thethermosetting material M1 is injected into the chamber 52 and cured. Thecured thermosetting material M2 is then separated from the mould 50 toform the interposer substrate 110 with the blind holes H1. The shape andthickness of the interposer substrate 110 and the positions and depth ofthe blind holes H1 are corresponding to the shape and thickness of thechamber 52 and the shape and thickness of the protrusions 54.Thereafter, the conductive material C1 is filled into the blind holes H1through a plating or deposition process, so as to form the conductivepillars 110 a through a polishing process or an etching process. Itshould be noted that the thickness of the interposer substrate 110 andthe depth of the blind holes H1 in FIG. 2D can be determined by thespacing D1 of the chamber 52 and the length D2 of the protrusions 54 inFIG. 2B and accordingly the manufacturing procedure can be simplified.Additionally, in the semiconductor device manufacturing method providedby the present embodiment, the blind holes need not to be formed throughany etching or laser process, so that the manufacturing cost of theinterposer substrate 110 is reduced.

Next, referring to FIG. 2F, a first conductive pattern layer 120 isformed on the first surface S1 of the interposer substrate 110, wherethe first conductive pattern layer 120 is a conductive wire structureand is electrically connected with the conductive pillars 110 a (stepS160). Referring to FIG. 2G, a plurality of first bumps 130 are formedon the first conductive pattern layer 120, where the first bumps 130 areelectrically connected with the first conductive pattern layer 120.Referring to FIG. 2H again, a processing step is performed on the secondsurface S2 of the interposer substrate 110 to turn the blind holes H1into a plurality of through holes H2. To be specific, in the processingstep, the second surface S2 of the interposer substrate 110 may bepolished, cut, or etched to expose the blind holes H1 and form thethrough holes H2.

Thereafter, referring to FIG. 2I, a second conductive pattern layer 140is formed on the second surface S2 of the interposer substrate 110, andthe second conductive pattern layer 140 is a conductive wire structureand is electrically connected with the conductive pillars 110 a.Referring to FIG. 2J, a plurality of second bumps 150 are formed on thesecond conductive pattern layer 140, and the second bumps 150 areelectrically connected with the second conductive pattern layer 140.

Next, referring to FIG. 2K, a chip 160 is stacked on the interposersubstrate 110, and the chip 160 is electrically connected with the firstconductive pattern layer 120 on the interposer substrate 110 through thefirst bumps 130. Referring to FIG. 2L, the chip 160 and the interposersubstrate 110 are stacked on a substrate 170, and the substrate 170 iselectrically connected with the second conductive pattern layer 140 ofthe interposer substrate 110 through the second bumps 150. In thepresent embodiment, the substrate 170 is an organic substrate made of anorganic material. However, the present disclosure is not limitedthereto. By now, the manufacturing procedure of a semiconductor device100 is completed.

It should be noted that in the present embodiment, the shape andthickness of the interposer substrate 110 and the positions and depth ofthe blind holes H1 can be defined according to the actual requirementand through the mould 50. In the present embodiment, as shown in FIG.2B, the spacing D1 of the chamber 52 is approximately smaller than 5 mm,and the length D2 of the protrusions 54 is smaller than the spacing D1of the chamber 52. Thus, the thickness of the interposer substrate 110manufactured through foregoing steps S110-S140 by using the mould 50 isapproximately smaller than 5 mm (i.e., corresponding to the spacing D1of the chamber 52 in FIG. 2B), where the positions of the blind holes H1are corresponding to the positions of the protrusions 54 in FIG. 2B, andthe depth of the blind holes H1 is the length D2 of the protrusions 54and is smaller than the spacing D1 of the chamber 52. In addition, thethickness of the chip 160 is about 0.7 mm (the chip 160 may be worn thinaccording to the requirement and the thickness thereof may be smallerthan 0.7 mm), and the thickness of the substrate 170 is about 1-2 mm.

FIGS. 4A-4H are diagrams illustrating the semiconductor devicemanufacturing method in FIG. 1 according to another embodiment of thepresent disclosure. Referring to FIG. 1 and FIG. 4A first, a mould 60 isprovided, and the mould 60 has a chamber 62 and a plurality ofprotrusions 64 in the chamber 62 (step S110). It should be noted thatthe mould 60 in FIG. 4A is similar to the mould 50 in FIG. 2A, and thedifference between the two is that the chamber 62 of the mould 60further has a plurality of patterns 66, and parts of the protrusions 64are connected with the patterns 66. In other embodiments, the patternsexist in the chamber independently. To be specific, the chamber 62 iscomposed of a top cover 60 a and a bottom cover 60 b, and the spacing ofthe chamber 62 is D1 (as shown in FIG. 4B). In the present embodiment,the spacing D1 of the chamber 62 is approximately smaller than 5 mm.

In the present embodiment, the mould 60, the protrusions 64, and thepatterns 66 are integrally formed and made of the same material. Forexample, the mould 60, the protrusions 64, and the patterns 66 are madeof a tungsten alloy. However, the mould 60 may also be made through thesame procedure as the mould 50 illustrated in FIG. 3. Namely, the mould60, the protrusions 64, and the patterns 66 may be made of differentmaterials. For example, the protrusions 64 and the patterns 66 are madeof silicon or a tungsten alloy and formed on the top cover 60 a of themould 60, while the mould 60 is made of a metal material different fromthat of the protrusions 64.

In the present embodiment, the length of the protrusions 64 is D2, andthe length of the patterns 66 is D3, as shown in FIG. 4B. However, thespacing of the chamber, the length of the protrusions, and the length ofthe patterns are not limited in the present disclosure and can beadjusted according to the actual requirement. The patterns 66 are servedaccording to the design requirement as an interconnection layer forconnecting the protrusions 64. In addition, in the present embodiment,the length D3 of the patterns 66 is smaller than the length of theprotrusions 64, and the length D2 of the protrusions 64 is smaller thanthe spacing D1 of the chamber 52.

Referring to FIG. 4B again, a thermosetting material M1 is injected intothe chamber 62 (step S120). In the present embodiment, the thermosettingmaterial M1 is an insulator, such as EMC, PI, silicon resin, PU, or acompound of one of aforementioned material with a filler, a hardener, acoupling agent, or any other additive agent. Referring to FIG. 4C, thethermosetting material M1 is cured (step S130) and turned into a curedthermosetting material M2.

Next, referring to FIG. 4D, a parting step is performed to separate thecured thermosetting material M2 from the mould 60 to form an interposersubstrate 210, wherein a plurality of blind holes H1 corresponding tothe protrusions 64 are formed on the interposer substrate 210 (stepS140). After the parting step S140, a plurality of grooves 210 acorresponding to the patterns 66 are formed on the interposer substrate210, where a part of the blind holes H1 are connected with the grooves210 a.

Referring to FIG. 4E, a conductive material C1 is filled into the blindholes H1 to form a plurality of conductive pillars 210 b (step S150).Meanwhile, the conductive material C1 is filled into the grooves 210 ato form a first conductive pattern layer 220 electrically connected withthe conductive pillars 210 b, where the first conductive pattern layer220 is a conductive wire structure, and the surface S3 of the firstconductive pattern layer 220 and the first surface S1 of the interposersubstrate 210 are coplanar. To be specific, the conductive material C1may be Cu, Ti, Ta, W, or a combination of aforementioned metals andmetal compounds but not limited herein. The conductive material C1 maybe filled into the blind holes H1 and the grooves 210 a through aplating process or a deposition process. The blind holes H1 and thegrooves 210 a can be completely or partially filled with the conductivematerial C1 as long as an electrical connection is achieved. After that,metal on the surface S1 is removed through a polishing process or anetching process to respectively form the conductive pillars 210 b andthe first conductive pattern layer 220.

Thereby, in the present embodiment, the interposer substrate 210 isfabricated by using the thermosetting material M1 (for example, EMC),and the shape and thickness of the interposer substrate 210, thepositions and depth of the blind holes H1, and the positions and depthof the grooves 210 a are determined according to the actual requirementand through the mould 60. To be specific, in the present embodiment, themould 60 (as shown in FIG. 4A) with the protrusions 64 and the patterns66 is designed, and the thermosetting material M1 is injected into thechamber 62 and cured. The cured thermosetting material M2 is thenseparated from the mould 60 to form the interposer substrate 210 withthe blind holes H1 and the grooves 210 a. The shape and thickness of theinterposer substrate 210, the positions and depth of the blind holes H1,and the positions and depth of the grooves 210 a are respectivelycorresponding to the shape and thickness of the chamber 62, the shapeand thickness of the protrusions 64, and the shape and thickness of thepatterns 66. Thereafter, the conductive material C1 is filled into theblind holes H1 and the grooves 210 a through a plating or depositionprocess, so as to form the conductive pillars 210 b and the firstconductive pattern layer 220.

It should be noted that the thickness of the interposer substrate 210,the depth of the blind holes H1, and the depth of the grooves 210 a asshown in FIG. 4D can be determined by the spacing D1 of the chamber 62,the length D2 of the protrusions 64, and the length D3 of the patterns66 as shown in FIG. 4B. To be specific, as shown in FIG. 4B, the spacingD1 of the chamber 62 is approximately smaller than 5 mm. Besides, thelength D3 of the patterns 66 is smaller than the length D2 of theprotrusions 64, and the length D2 of the protrusions 64 is smaller thanthe spacing D1 of the chamber 52. Thus, the thickness of the interposersubstrate 210 fabricated by using the mould 60 is approximately smallerthan 5 mm (i.e., corresponding to the spacing D1 of the chamber 62 inFIG. 4B), where the positions of the blind holes H1 and the positions ofthe grooves 210 a are respectively corresponding to the positions of theprotrusions 64 and the positions of the patterns 66 in FIG. 4B, thedepth of the blind holes H1 is corresponding to the length D2 of theprotrusions 64, and the depth of the grooves 210 a is corresponding tothe length D3 of the patterns 66. Thereby, in the manufacturing methodprovided by the present embodiment, the interposer substrate 210 havingboth the blind holes H1 and the grooves 210 a can be fabricated, and theshape and thickness of the interposer substrate 210, the depth of theblind holes H1, and the depth of the grooves 210 a can be determinedaccording to the actual design requirement and through the mould 60.Additionally, in the semiconductor device manufacturing method providedby the present embodiment, the blind holes and the grooves need not tobe formed through any etching or laser process, and the blind holes H1need not to be filled through any plating or deposition process to formthe conductive pillars 210 b or the first conductive pattern layer 220,so that the manufacturing procedure is simplified and the manufacturingcost of the interposer substrate 210 is reduced.

Next, referring to FIG. 4F, a plurality of first bumps 230 are formed onthe first conductive pattern layer 220, where the first bumps 230 areelectrically connected with the first conductive pattern layer 220.Referring to FIG. 4G, a processing step is performed on the secondsurface S2 of the interposer substrate 210 to turn the blind holes H1into a plurality of through holes H2. To be specific, in the processingstep, the second surface S2 of the interposer substrate 210 is polished,cut, or etched to expose the blind holes H1 and form the through holesH2.

Referring to FIG. 4H, a second conductive pattern layer 240 is formed onthe second surface S2 of the interposer substrate 210, and a pluralityof second bumps 250 electrically connected with the second conductivepattern layer 240 are formed on the second conductive pattern layer 240,where the second conductive pattern layer 240 is a conductive wirestructure and is electrically connected with the conductive pillars 210b.

Thereafter, a chip 260 and the interposer substrate 210 are stacked on asubstrate 270, where the substrate 270 may be an organic substrate madeof an organic material, and the chip 260 and the substrate 270 areelectrically connected with the first conductive pattern layer 220 andthe second conductive pattern layer 240 on the interposer substrate 210respectively through the first bumps 230 and the second bumps 250. Bynow, the manufacturing procedure of a semiconductor device 200 iscompleted. It should be noted that the steps of the semiconductor devicemanufacturing method illustrated in FIG. 4H can be performed tosequentially form the second conductive pattern layer 240, the secondbumps 250, the chip 260, and the substrate 270 by referring to the stepsillustrated in FIGS. 2I-2L.

FIGS. 5A-5I are diagrams illustrating the semiconductor devicemanufacturing method in FIG. 1 according to yet another embodiment ofthe present disclosure. Referring to FIG. 1 and FIG. 5A first, a mould70 is provided, where the mould 70 has a chamber 72 and a plurality ofprotrusions 74 in the chamber 72 (step S110). To be specific, thechamber 72 is composed of a top cover 70 a and a bottom cover 70 b, andthe spacing of the chamber 72 is D1 (as shown in FIG. 5B, and thespacing D1 does not include the carrier substrate 380 in FIG. 5B). Inthe present embodiment, the spacing D1 of the chamber 72 isapproximately smaller than 5 mm.

In the present embodiment, the mould 70 and the protrusions 74 areintegrally formed and made of the same material. For example, the mould70 and the protrusions 74 are made of tungsten alloy. However, the mould70 may also adopt the mould 50 illustrated in FIG. 3. In this case, themould 70 and the protrusions 74 are made of different materials. Forexample, the protrusions 74 are made of silicon or tungsten alloy andformed on the top cover 70 a of the mould 70, while the mould 70 is madeof a metal material different from that of the protrusions 74.

The length of the protrusions 74 is D2, as shown in FIG. 5B. However,the spacing of the chamber and the length of the protrusions are notlimited in the present disclosure and can be adjusted according to theactual requirement. Besides, in the present embodiment, the length D2 ofthe protrusions 74 is smaller than the spacing D1 of the chamber 72.

Step S110 in the semiconductor device manufacturing method illustratedFIG. 5A is similar to that in the semiconductor device manufacturingmethod illustrated in FIG. 2A, and the difference is that in the presentembodiment, the carrier substrate 380 is disposed in the chamber 72 andleaned against the bottom cover 70 b, where the carrier substrate 380may be made be made of silicon or glass and may be a wafer or in anyother pattern suitable for subsequent manufacturing process.

Referring to FIG. 5B, a thermosetting material M1 is injected into thechamber 52 (step S120). In the present embodiment, the thermosettingmaterial M1 is an insulator, such as EMC, PI, silicon resin, PU, or acompound of one of aforementioned material with a filler, a hardener, acoupling agent, or any other additive agent. Next, referring to FIG. 5C,the thermosetting material M1 is cured (step S130) and turned into acured thermosetting material M2.

Thereafter, referring to FIG. 5D, a parting step is performed toseparate the cured thermosetting material M2 from the mould 70, so as toform an interposer substrate 310, where a plurality of blind holes H1corresponding to the protrusions 74 are formed on the interposersubstrate 310 (step S140). After the parting step S140, the interposersubstrate 310 is carried by the carrier substrate 380.

Referring to FIG. 5E, a conductive material C1 is filled into the blindholes H1 to form a plurality of conductive pillars 310 a (step S150). Tobe specific, the conductive material C1 may be Cu, Ti, Ta, W, or acombination of aforementioned metals and metal compounds but not limitedherein. The conductive material C1 may be filled into the blind holes H1through a plating process or a deposition process. The blind holes H1can be completely or partially filled with the conductive material C1 aslong as an electrical connection is achieved. After that, metal on thesurface S1 is removed through a polishing process or an etching processto form the conductive pillars 310 a.

Thereby, in the present embodiment, the interposer substrate 310 isfabricated by using the thermosetting material M1 (for example, EMC),and the shape and thickness of the interposer substrate 310 and thepositions and depth of the blind holes H1 are determined according tothe actual requirement and through the mould 70. To be specific, in thepresent embodiment, the mould 70 with the protrusions 74 (as shown inFIG. 5A) is designed, and the carrier substrate 380 is disposed in thechamber 72, so as to fabricate the interposer substrate 310 on thecarrier substrate 380. After that, the thermosetting material M1 iscured in the chamber 72 and separated from the mould 70 to form theinterposer substrate 310 with the blind holes H1. Next, the conductivematerial C1 is filled into the blind holes H1 through a plating ordeposition process to form the conductive pillars 310 a. It should benoted that the thickness of the interposer substrate 310 and the depthof the blind holes H1 can be determined by the spacing D1 of the chamber72 and the length D2 of the protrusions 74 (as shown in FIG. 5B), sothat the manufacturing procedure can be simplified. Additionally, in thesemiconductor device manufacturing method provided by the presentembodiment, the blind holes need not to be formed through any etching orlaser process, so that the manufacturing cost of the interposersubstrate 310 is reduced.

Next, referring to FIG. 5F, a first conductive pattern layer 320 isformed on the first surface S1 of the interposer substrate 310, wherethe first conductive pattern layer 320 is a conductive wire structureand is electrically connected with the conductive pillars 310 a (stepS160). Referring to FIG. 5G, a plurality of first bumps 330 are formedon the first conductive pattern layer 320, where the first bumps 330 iselectrically connected with the first conductive pattern layer 320.Referring to FIG. 5H, the carrier substrate 380 is removed, and aprocessing step is performed on the second surface S2 of the interposersubstrate 310 to turn the blind holes H1 into a plurality of throughholes H2. To be specific, in the processing step, the second surface S2of the interposer substrate 310 is polished, cut, or etched to exposethe blind holes H1 and form the through holes H2.

Referring to FIG. 5I, a second conductive pattern layer 340 is formed onthe second surface S2 of the interposer substrate 310, and a pluralityof second bumps 350 electrically connected with the second conductivepattern layer 340 are formed on the second conductive pattern layer 340,where the second conductive pattern layer 340 is a conductive wirestructure and is electrically connected with the conductive pillars 310a.

Additionally, a chip 360 and the interposer substrate 310 are stacked ona substrate 370, where the substrate 370 is an organic substrate made ofan organic material, and the chip 360 and the substrate 370 areelectrically connected with the first conductive pattern layer 320 andthe second conductive pattern layer 340 on the interposer substrate 310respectively through the first bumps 330 and the second bumps 350. Bynow, the manufacturing procedure of a semiconductor device 300 iscompleted. It should be noted that the steps of the semiconductor devicemanufacturing method illustrated in FIG. 5I can be performed tosequentially fabricate the second conductive pattern layer 340, thesecond bumps 350, the chip 360, and the substrate 370 by referring tothe steps illustrated in FIGS. 2I-2L.

FIGS. 6A-6I are diagrams illustrating the semiconductor devicemanufacturing method in FIG. 1 according to still another embodiment ofthe present disclosure. Referring to FIG. 1 and FIG. 6A first, a mould80 is provided, where the mould 80 has a chamber 82 and a plurality ofprotrusions 84 in the chamber 82 (step S110). To be specific, thechamber 82 is composed of a top cover 80 a and a bottom cover 80 b, andthe spacing of the chamber 82 is D1 (as shown in FIG. 6B, and thespacing D1 does not include the carrier substrate 480 and the bufferlayer 490 in FIG. 6B). In the present embodiment, the spacing D1 of thechamber 82 is approximately smaller than 5 mm.

It should be noted that the mould 80 in FIG. 6A is similar to the mould70 in FIG. 5A. Accordingly, the mould 80 and the protrusions 84 areintegrally formed by using the same material. For example, the mould 80and the protrusions 84 are made of tungsten alloy. However, the mould 80may also adopt the mould 50 illustrated in FIG. 3. In this case, themould 80 and the protrusions 84 are made of different materials. Forexample, the protrusions 84 are made of silicon or tungsten alloy andare formed on the top cover 80 a of the mould 80, while the mould 80 ismade of a metal material different from that of the protrusions 84.

The length of the protrusions 84 is D2, as shown in FIG. 6B. However,the spacing of the chamber and the length of the protrusions are notlimited in the present disclosure and can be adjusted according to theactual requirement.

Step S110 of the semiconductor device manufacturing method illustratedin FIG. 6A is similar to that in the semiconductor device manufacturingmethod illustrated in FIG. 5A, and the difference is that in the presentembodiment, a buffer layer 490 is formed on a carrier substrate 480,where the protrusions 84 of the mould 80 are inserted into the bufferlayer 490. The buffer layer 490 is made of benzocyclobutene (BCB),silicon dioxide, or a polymeric compound, while the material of thecarrier substrate 480 can be referred to that of the carrier substrate380 illustrated in FIG. 5A and will not be described herein.

Referring to FIG. 6B, a thermosetting material M1 is injected into thechamber 82 (step S120). In the present embodiment, the thermosettingmaterial M1 is an insulator, such as EMC, PI, silicon resin, PU, or acompound of one of aforementioned material with a filler, a hardener, acoupling agent, or any other additive agent. Referring to FIG. 6C, thethermosetting material M1 is cured (step S130) and turned into a curedthermosetting material M2.

Next, referring to FIG. 6D, a parting step is performed to separate thecured thermosetting material M2 from the mould 80, so as to form aninterposer substrate 410, where a plurality of blind holes H1corresponding to the protrusions 84 are formed on the interposersubstrate 410 (step S140). Additionally, the interposer substrate 410 iscarried by the carrier substrate 480, and the blind holes H1 penetratethe buffer layer 490.

Referring to FIG. 6E, a conductive material C1 is filled into the blindholes H1 to form a plurality of conductive pillars 410 a (step S150),and the conductive pillars 410 a are inserted into the buffer layer 490.To be specific, the conductive material C1 may be Cu, Ti, Ta, W, or acombination of aforementioned metals and metal compounds but not limitedherein. The conductive material C1 may be filled into the blind holes H1through a plating process or a deposition process. The blind holes H1can be completely or partially filled with the conductive material C1 aslong as an electrical connection is achieved. After that, metal on thesurface S1 is removed through a polishing process or an etching processto form the conductive pillars 410 a and allow the blind holes and theconductive pillars 410 a to penetrate the buffer layer 490.

Thereafter, referring to FIG. 6F, a first conductive pattern layer 420is formed on the first surface S1 of the interposer substrate 410, wherethe first conductive pattern layer 420 is a conductive wire structureand is electrically connected with the conductive pillars 410 a (stepS160). Referring to FIG. 6G, a plurality of first bumps 430 are formedon the first conductive pattern layer 420, where the first bumps 430 areelectrically connected with the first conductive pattern layer 420.Referring to FIG. 6H, the carrier substrate 480 and the buffer layer 490are removed to allow the conductive pillars 410 a to protrude from theinterposer substrate 410. To be specific, in the processing step, thesecond surface S2 of the interposer substrate 410 and the blind holes H1can be exposed to form the through holes H2 without going through anypolishing, cutting, or etching process.

Thereby, in the present embodiment, the interposer substrate 410 isfabricated by using the thermosetting material M1 (for example, EMC),and the shape and thickness of the interposer substrate 410 and thepositions and depth of the blind holes H1 can be determined according tothe actual design requirement and through the mould 80. To be specific,in the present embodiment, the mould 80 with the protrusions 84 (asshown in FIG. 6A) is designed, and the carrier substrate 480 and thebuffer layer 490 are sequentially disposed in the chamber 82, so as toform the interposer substrate 310 with the blind holes H1 on the carriersubstrate 480 and the buffer layer 490, where the blind holes H1penetrate the buffer layer 490. After that, the conductive material C1is filled into the blind holes H1 to form the conductive pillars 410 a.Next, after the carrier substrate 480 and the buffer layer 490 areremoved, the conductive pillars 410 a protrude from the interposersubstrate 410 therefore can be served as bumps for achieving anelectrical connection. However, similar to the embodiment describedabove (as shown in FIGS. 5A-5I), the thickness of the interposersubstrate 410 and the depth of the blind holes H1 can be determined bythe spacing D1 of the chamber 82 and the length D2 of the protrusions 84in FIG. 6B. Thus, the manufacturing procedure can be simplified.Additionally, in the semiconductor device manufacturing method providedby the present embodiment, the blind holes H1 need not to be formedthrough any etching or laser process. Accordingly, the manufacturingcost of the interposer substrate 410 is reduced.

Referring to FIG. 6I, a second conductive pattern layer 440 is formed onthe second surface S2 of the interposer substrate 410, and a pluralityof second bumps 450 electrically connected with the second conductivepattern layer 440 are formed on the second conductive pattern layer 440,where the second conductive pattern layer 440 is a conductive wirestructure and is electrically connected with the conductive pillars 410a.

After that, a chip 460 and the interposer substrate 410 are stacked on asubstrate 470, where the substrate 470 is an organic substrate made ofan organic material, and the chip 460 and the substrate 470 areelectrically connected with the first conductive pattern layer 420 andthe second conductive pattern layer 440 on the interposer substrate 410respectively through the first bumps 430 and the second bumps 450. Bynow, the manufacturing procedure of a semiconductor device 400 iscompleted.

FIG. 7 is a flowchart of a manufacturing method of a semiconductordevice according to another embodiment of the present disclosure. FIGS.8A-8L are diagrams illustrating the semiconductor device manufacturingmethod in FIG. 7. Referring to FIG. 7 and FIG. 8A first, a mould 90 anda metal film 20 are provided, where the mould 90 has a cover 92 and achamber 94, and the cover 92 has a plurality of vias 92 a (step S710).To be specific, the chamber 94 is composed of the cover 92 and a bottomcover 96. In the present embodiment, the spacing of the chamber 94 is D1(as shown in FIG. 8C) and is approximately smaller than 5 mm. The metalfilm 20 may be made of aluminium, copper, or gold.

Referring to FIG. 8B, the metal film 20 is heated and pressed to thecover 92 to be passed through the vias 92 a of the cover 92 and form aplurality of conductive pillars 510 a in the chamber 94 (step S720),where the length (referring to the length of the parts of the conductivepillars 510 a protruding from the cover 92) of the conductive pillars510 a is D2. Thereafter, the conductive pillars 510 a are cooled downand cured to form a plurality of conductive pillars 510 b.

Next, referring to FIG. 8C, a thermosetting material M1 is injected intothe chamber 94 of the mould 90 to allow the thermosetting material M1 toencapsulate the conductive pillars 510 b (step S730). In the presentembodiment, the thermosetting material M1 is an insulator, such as EMC,PI, silicon resin, PU, or a compound of one of aforementioned materialwith a filler, a hardener, a coupling agent, or any other additiveagent. Referring to FIG. 8D, the thermosetting material M1 is cured(step S740) and turned into a cured thermosetting material M2.

Next, referring to FIG. 8E, a parting step is performed to separate thecured thermosetting material M2 from the mould 90, so as to form aninterposer substrate 510, where the conductive pillars 510 b are in theinterposer substrate 510 (step S750). It should be noted that when theparting step S750 is performed, the interposer substrate 510 is removedfrom the cover 92 along with the conductive pillars 510 a. In otherwords, in the present embodiment, the mould 90 with the conductivepillars 510 b (as shown in FIG. 8C) is designed, and the thermosettingmaterial M1 is injected into the chamber 94 and cured. The curedthermosetting material M2 is then separated from the mould 90 to formthe interposer substrate 510 with the conductive pillars 510 b (as shownin FIG. 8E). Thus, the blind holes need not to be formed advance, and noplating or deposition process is required to form the conductive pillars510 b. Thus, the manufacturing procedure of the interposer substrate 510is simplified, and accordingly the manufacturing cost of the interposersubstrate 510 is reduced.

Thereafter, referring to FIG. 8F, a first conductive pattern layer 520is formed on the first surface S1 of the interposer substrate 510, wherethe first conductive pattern layer 520 is a conductive wire structureand is electrically connected with the conductive pillars 510 b (stepS760). Referring to FIG. 8G, a plurality of first bumps 530 are formedon the first conductive pattern layer 520, where the first bumps 530 areelectrically connected with the first conductive pattern layer 520.Referring to FIG. 8H, a processing step is performed on the secondsurface S2 of the interposer substrate 510 to turn the blind holes H1into a plurality of through holes H2. To be specific, in the processingstep, the second surface S2 of the interposer substrate 510 is polished,cut, or etched to expose the blind holes H1 and form the through holesH2.

Next, referring to FIG. 8I, a second conductive pattern layer 540 isformed on the second surface S2 of the interposer substrate 510, wherethe second conductive pattern layer 540 is a conductive wire structureand is electrically connected with the conductive pillars 510 b.referring to FIG. 8J, a plurality of second bumps 550 are formed on thesecond conductive pattern layer 540, where the second bumps 550 areelectrically connected with the second conductive pattern layer 540.

Next, referring to FIG. 8K, a chip 560 is stacked on the interposersubstrate 510, and the chip 560 is electrically connected with the firstconductive pattern layer 520 on the interposer substrate 510 through thefirst bumps 530. Referring to FIG. 8L, the chip 560 and the interposersubstrate 510 are stacked on a substrate 570, and the substrate 570 iselectrically connected with the second conductive pattern layer 540 ofthe interposer substrate 510 through the second bumps 550. In thepresent embodiment, the substrate 570 is an organic substrate made of anorganic material. However, the present disclosure is not limitedthereto. By now, the manufacturing procedure of a semiconductor device500 is completed.

It should be noted that in the present embodiment, the shape andthickness of the interposer substrate 510 and the positions and depth ofthe conductive pillars 510 a can be determined according to the actualdesign requirement and through the mould 90. In the present embodiment,as shown in FIG. 8C, the spacing D1 of the chamber 94 is approximatelysmaller than 5 mm, and the length of the conductive pillars 510 a formedthrough the steps illustrated in FIG. 8B is D2 and is smaller than thespacing D1 of the chamber 94. Thus, the thickness of the interposersubstrate 510 fabricated by using the mould 90 is approximately smallerthan 5 mm (i.e., corresponding to the spacing D1 of the chamber 94 inFIG. 8C), where the positions and depth of the conductive pillars 510 ain FIG. 8B are corresponding to the positions and depth of theconductive pillars 510 a in the interposer substrate 510 illustrated inFIG. 8E. Additionally, the thickness of the chip 560 is about 0.7 mm,and the thickness of the substrate 570 is about 1-2 mm.

FIG. 9 is a diagram of a semiconductor device according to an embodimentof the present disclosure. Referring to FIG. 9, the semiconductor device600 in the present embodiment includes an interposer substrate 610, aplurality of conductive pillars 610 a, and a first conductive patternlayer 620. The interposer substrate 610 has a first surface S1. Aplurality of blind holes H1 and a plurality of grooves 610 b are formedon the first surface S1 of the interposer substrate 610. The grooves 610b are connected with part of the blind holes H1. A plurality ofconductive pillars 610 a are disposed in the blind holes H1 of theinterposer substrate 610. The first conductive pattern layer 620 may bea conductive wire structure and is disposed in the grooves 610 b.

It should be noted that in the present embodiment, the semiconductordevice 600 with the first conductive pattern layer 620 illustrated inFIG. 9 can be manufactured through the semiconductor devicemanufacturing method illustrated in FIGS. 4A-4E. In the presentembodiment, the surface S3 of the first conductive pattern layer 620 ofthe semiconductor device 600 is coplanar with the first surface S1 ofthe interposer substrate 610 (i.e., the first conductive pattern layer620 does not protrude from the first surface S1 of the interposersubstrate 610). Thus, the overall size of the semiconductor device 600is reduced.

In the present embodiment, the semiconductor device 600 further includesa plurality of first bumps 630 disposed on the first conductive patternlayer 620. To be specific, the blind holes H1 are ran through the secondsurface S2 of the interposer substrate 610 to form a plurality ofthrough holes H2, and the conductive pillars 510 a are in the throughholes H2. The semiconductor device 600 further includes a secondconductive pattern layer 640 and a plurality of second bumps 650. Thesecond conductive pattern layer 640 may be a conductive wire structureand disposed on the second surface S2 of the interposer substrate 610,and the second conductive pattern layer 640 is electrically connectedwith the conductive pillars 510 a, where the second bumps 650 aredisposed on the second conductive pattern layer 640.

Additionally, the semiconductor device 600 further includes a chip 660and a substrate 670. The chip 660 is disposed on the substrate 670,where the interposer substrate 610 is between the substrate 670 and thechip 660. The chip 660 is electrically connected with the firstconductive pattern layer 620 on the interposer substrate 610 through thefirst bumps 630, and the substrate 670 is electrically connected withthe second conductive pattern layer 640 on the interposer substrate 610through the second bumps 650. However, the first bumps 630, the secondconductive pattern layer 640, the second bumps 650, and the stacking ofthe chip 660 and the substrate 670 can be fabricated through thesemiconductor device manufacturing method illustrated in FIGS. 4F-4H.

As described above, embodiments of the present disclosure provide asemiconductor device and a manufacturing method thereof, in which aninterposer substrate is fabricated by using an electrically insulatingthermosetting material, and the shape and thickness of the interposersubstrate and the positions and depth of conductive pillars are definedaccording to the actual design requirement and through a mould. To bespecific, in the present embodiment, a mould with protrusions (orconductive pillars) is designed, and a thermosetting material isinjected into the chamber and cured. The cured thermosetting material isthen separated from the mould to form the interposer substrate withblind holes (or conductive pillars), and the thickness of the interposersubstrate and the size of the protrusions (or conductive pillars) aredefined through the mould. Thus, the manufacturing procedure issimplified. Besides, because no etching or laser process is performed toform the blind holes and no plating or deposition process is performedto form the conductive pillars, the manufacturing cost of the interposersubstrate is reduced.

It will be apparent to those skilled in the art that variousmodifications and variations can be made to the structure of thedisclosed embodiments without departing from the scope or spirit of thedisclosure. In view of the foregoing, it is intended that the disclosurecover modifications and variations of this disclosure provided they fallwithin the scope of the following claims and their equivalents.

What is claimed is:
 1. A manufacturing method of a semiconductor device, comprising: providing a mould, wherein the mould has a chamber and a plurality of protrusions in the chamber; injecting a thermosetting material into the chamber; curing the thermosetting material; separating the cured thermosetting material from the mould to form an interposer substrate, wherein a plurality of blind holes corresponding to the protrusions is formed on the interposer substrate; filling a conductive material into the blind holes to form a plurality of conductive pillars; and forming a first conductive pattern layer on a first surface of the interposer substrate, wherein the first conductive pattern layer is electrically connected with the conductive pillars, the chamber further comprises a plurality of patterns, and after separating the cured thermosetting material from the mould, a plurality of grooves corresponding to the patterns is formed on the interposer substrate, wherein a part of the blind holes is electrically connected with the grooves.
 2. The manufacturing method according to claim 1 further comprising: forming a plurality of first bumps on the first conductive pattern layer, wherein the first bumps are electrically connected with the first conductive pattern layer.
 3. The manufacturing method according to claim 2 further comprising: forming a second conductive pattern layer on a second surface of the interposer substrate, wherein the second conductive pattern layer is electrically connected with the conductive pillars; and forming a plurality of second bumps on the second conductive pattern layer, wherein the second bumps are electrically connected with the second conductive pattern layer.
 4. The manufacturing method according to claim 3 further comprising: stacking a chip on the interposer substrate, wherein the chip is electrically connected with the first conductive pattern layer on the interposer substrate through the first bumps; and stacking the chip and the interposer substrate on a substrate, wherein the substrate is electrically connected with the second conductive pattern layer on the interposer substrate through the second bumps.
 5. The manufacturing method according to claim 1 further comprising performing a processing step on a second surface of the interposer substrate to turn the blind holes into a plurality of through holes.
 6. The manufacturing method according to claim 1, wherein when the conductive material is filled into the blind holes to form the conductive pillars, the conductive material is also filled into the grooves to form the first conductive pattern layer electrically connected with the conductive pillars.
 7. The manufacturing method according to claim 1 further comprising: disposing a carrier substrate in the chamber before filling the thermosetting material into the chamber; carrying the interposer substrate on the carrier substrate after separating the cured thermosetting material from the mould; and removing the carrier substrate after forming the first conductive pattern layer on the first surface of the interposer substrate.
 8. The manufacturing method according to claim 7 further comprising: forming a buffer layer on the carrier substrate, wherein the protrusions of the mould are inserted into the buffer layer, and the blind holes and the conductive pillars penetrate the buffer layer; and removing the carrier substrate and the buffer layer to allow the conductive pillars to protrude from the interposer substrate.
 9. The manufacturing method according to claim 1, wherein the thermosetting material is an insulator. 